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Proceedings Paper

Micro-optical structures for atom lithography studies
Author(s): Erol C. Harvey; Tracy R. Mackin; Brian C. Dempster; Robert E. Scholten
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Paper Abstract

Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to an atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements to manipulate the laser beam.

Paper Details

Date Published: 1 October 1999
PDF: 8 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364493
Show Author Affiliations
Erol C. Harvey, Swinburne Univ. of Technology (Australia)
Tracy R. Mackin, Univ. of Melbourne (Australia)
Brian C. Dempster, Swinburne Univ. of Technology (Australia)
Robert E. Scholten, Univ. of Melbourne (Australia)


Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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