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Proceedings Paper

Limiting factors in the production of deep microstructures
Author(s): David W. L. Tolfree; William O'Neill; Leslie Tunna; Christopher Sutcliffe
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Paper Abstract

Microsystems increasingly require precision deep microstructures that can be cost-effectively designed and manufactured. New products must be able to meet the demands of the rapidly growing markets for microfluidic, micro- optical and micromechanical devices in industrial sectors which include chemicals, pharmaceuticals, biosciences, medicine and food. The realization of such products, first requires an effective process to design and manufacture prototypes. Two process methods used for the fabrication of high aspect-ratio microstructures are based on X-ray beam lithography with electroforming processes and direct micromachining with a frequency multiplied Nd:YAG laser using nanosecond pulse widths. Factors which limit the efficiency and precision obtainable using such processes are important parameters when deciding on the best fabrication method to use. A basic microstructure with narrow channels suitable for a microfluidic mixer have been fabricated using both these techniques and comparisons made of the limitations and suitability of the processes in respect of fast prototyping and manufacture or working devices.

Paper Details

Date Published: 1 October 1999
PDF: 11 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364490
Show Author Affiliations
David W. L. Tolfree, Faraday Foresight Northwest Ltd. (United Kingdom)
William O'Neill, Univ. of Liverpool (United Kingdom)
Leslie Tunna, Univ. of Liverpool (United Kingdom)
Christopher Sutcliffe, Univ. of Liverpool (United Kingdom)

Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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