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Proceedings Paper

Dry release process of anhydrous HF gas-phase etching for the fabrication of a vibrating microgyroscope
Author(s): Won-Ick Jang; Chang-Auck Choi; Yoonshik Hong; Chi-Hoon Jun; Youn Tae Kim; Jong-Hyun Lee
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Paper Abstract

A micro gyroscope, which vibrates in two orthogonal axes on the substrate plane, is designed and fabricated. Fabrication processes of the micro gyroscope are composed of anisotropic silicon etching by RIE, dry release by newly developed anhydrous HF gas-phase etching (GPE) of the buried sacrificial oxide layer, stress relief by multi-step annealing, metal electrode formation. The GPE process was verified as a very effective method for the release of compliant microstructures of micro gyroscope. The developed GPE system with anhydrous HF gas and CH3OH vapor was characterized and its etching properties were discussed. We successfully fabricated micro gyroscope with no virtually process-induced stiction and no residual products after GPE of TEOS, LTO, and thermal oxide on silicon substrates.

Paper Details

Date Published: 1 October 1999
PDF: 8 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364477
Show Author Affiliations
Won-Ick Jang, Electronics and Telecommunications Research Institute (South Korea)
Chang-Auck Choi, Electronics and Telecommunications Research Institute (South Korea)
Yoonshik Hong, Electronics and Telecommunications Research Institute (South Korea)
Chi-Hoon Jun, Electronics and Telecommunications Research Institute (South Korea)
Youn Tae Kim, Electronics and Telecommunications Research Institute (South Korea)
Jong-Hyun Lee, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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