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Proceedings Paper

Generation of thin film micro-optics by crossed deposition through wire-grid masks
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Paper Abstract

Shading masks consisting of regular grids of thin metallic wires have been used for the vacuum deposition of micro- optical thin film components. The fabrication of cylindrical microlenses with single- and two-step procedures has been demonstrated. Refractive as well as partially reflective arrays with pitches greater than or equal to 50 micrometer have been realized with SiO2 and SiO2:HfO2 layers on glass, quartz and polymer substrates. The thickness profiles have been characterized interferometrically.

Paper Details

Date Published: 15 September 1999
PDF: 8 pages
Proc. SPIE 3825, Microsystems Metrology and Inspection, (15 September 1999); doi: 10.1117/12.364294
Show Author Affiliations
Uwe Griebner, Max-Born-Institute for Nonlinear Optics and Short-Pulse Spectroscopy (Germany)
Ruediger Grunwald, Max-Born-Institute for Nonlinear Optics and Short-Pulse Spectroscopy (Germany)


Published in SPIE Proceedings Vol. 3825:
Microsystems Metrology and Inspection
Christophe Gorecki, Editor(s)

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