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Proceedings Paper

Analysis of interferometric fringe patterns by optical wavelet transform
Author(s): Sven Krueger; Larbi Bouamama; Hartmut Gruber; Stephan Teiwes; Guenther K.G. Wernicke
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Paper Abstract

For the application of interferometric methods in industrial quality control and particularly in non-destructive material testing an extensive analysis of the obtained image data is needed. In the field of optical image processing wavelet transformation has been proved to be a capable tool in the detection of structures with definite spatial resolution. The selection of the analyzing wavelet function and the variation of parameters lead to a wide range of selective wavelet filters, which are able to perform detection and classification of structures. The presented paper demonstrates numerical simulations and their optical realization in an SLM- based correlator. To locate defect patterns of different classes in interferometric fringe patterns, several wavelet functions, which are optically realizable by a transmission distribution, were utilized. The optical experiments indicate a good accordance with the computer simulations.

Paper Details

Date Published: 21 September 1999
PDF: 7 pages
Proc. SPIE 3824, Optical Measurement Systems for Industrial Inspection, (21 September 1999); doi: 10.1117/12.364261
Show Author Affiliations
Sven Krueger, Humboldt Univ. zu Berlin (Germany)
Larbi Bouamama, Univ. Ferhat Abbas (Algeria)
Hartmut Gruber, Humboldt Univ. zu Berlin (Germany)
Stephan Teiwes, Humboldt Univ. zu Berlin (Germany)
Guenther K.G. Wernicke, Humboldt Univ. zu Berlin (Germany)

Published in SPIE Proceedings Vol. 3824:
Optical Measurement Systems for Industrial Inspection
Malgorzata Kujawinska; Wolfgang Osten, Editor(s)

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