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Proceedings Paper

Laser ablation and microstructuring of Si-containing polycarbonates and polyestercarbonates
Author(s): J. Wei; Juergen Stebani; Thilo Kunz; Christina Hahn; Thomas Lippert; Alexander J. Wokaun
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Paper Abstract

Si-containing polymers, which act as RIE-resists by generating a passivating SiO2 film on the polymer surfaces, are applied in microlithographic processes. New Si-containing polymers, i.e., Si-containing polycarbonates and polyestercarbonates have been synthesized. Various contents of Si (up to 30 wt%) were incorporated into the polymers. Thin films (about 100 micrometers thick) of the polymers were prepared for ablation and microstructuring at 308 nm. With a pinhole mask and a lens, a 10 X 10 matrix of circular craters was created on the polymer films. The fluence and number of pulses were varied for each crater. Ablation parameters (alpha) eff (effective absorption coefficient) and Fth (threshold fluence) were determined for each polymer. Using a reflecting objective (Schwarzschild type), microstructures with a sub-micron resolution can be produced on the polymer films. The quality of the ablated structures was evaluated by scanning electron microscopy. The incorporation of Si into polymers does not affect the ablation behavior of the polymers. Si-containing polyestercarbonates exhibited good ablation behavior, while surface swelling (incubation) was observed for polycarbonates films. The results from this work includes that Si-containing polyestercarbonates are suitable for laser ablation and microstructuring.

Paper Details

Date Published: 20 September 1999
PDF: 9 pages
Proc. SPIE 3822, Computer-Controlled Microshaping, (20 September 1999); doi: 10.1117/12.364224
Show Author Affiliations
J. Wei, Paul Scherrer Institut (Switzerland)
Juergen Stebani, Bayer AG (Germany)
Thilo Kunz, Paul Scherrer Institut (Switzerland)
Christina Hahn, Paul Scherrer Institut (Switzerland)
Thomas Lippert, Paul Scherrer Institut (Switzerland)
Alexander J. Wokaun, Paul Scherrer Institut (Switzerland)


Published in SPIE Proceedings Vol. 3822:
Computer-Controlled Microshaping
Vadim P. Veiko; Tamas Szoerenyi, Editor(s)

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