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Proceedings Paper

Ablation of solid targets with UV femtosecond pulses
Author(s): Peter Simon; Juergen Ihlemann; Jan-Hendrik Klein-Wiele; Jozsef Bekesi; Gerd Marowsky
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Paper Abstract

Ablation of submicron structures on metals and semiconductors is presented using subpicosecond laser pulses at 248 nm. Morphology changes as a function of pulse duration have been investigated. The dynamics of the surface modification has been studied using a pump-probe technique. Diffracted signals of a probe beam on laser induced gratings provide information on the dynamics of the electron phonon interaction, melting and material removal simultaneously. For metals, in the first 5 - 10 ps following irradiation the electron-phonon relaxation dominates the process, followed by melting, expansion and violent material ejection. For semiconductors, rapid amorphization of the surface occurs within a couple of hundred femtoseconds following irradiation, with less pronounced indication for the development of molten material.

Paper Details

Date Published: 20 September 1999
PDF: 7 pages
Proc. SPIE 3822, Computer-Controlled Microshaping, (20 September 1999); doi: 10.1117/12.364219
Show Author Affiliations
Peter Simon, Laser-Lab. Goettingen e.V. (Germany)
Juergen Ihlemann, Laser-Lab. Goettingen e.V. (Germany)
Jan-Hendrik Klein-Wiele, Laser-Lab. Goettingen e.V. (Germany)
Jozsef Bekesi, Laser-Lab. Goettingen e.V. (Germany)
Gerd Marowsky, Laser-Lab. Goettingen e.V. (Germany)


Published in SPIE Proceedings Vol. 3822:
Computer-Controlled Microshaping

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