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Proceedings Paper

Exposure schedule for multiplexing holograms in photopolymer
Author(s): Shiuan-Huei Lin; Ken Yuh Hsu; Wei-Zheng Chen; Wha-Tzong Whang
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Paper Abstract

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.

Paper Details

Date Published: 20 September 1999
PDF: 7 pages
Proc. SPIE 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V, (20 September 1999); doi: 10.1117/12.363923
Show Author Affiliations
Shiuan-Huei Lin, National Chiao Tung Univ. (Taiwan)
Ken Yuh Hsu, National Chiao Tung Univ. (Taiwan)
Wei-Zheng Chen, National Chiao Tung Univ. (Taiwan)
Wha-Tzong Whang, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 3801:
Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V
Francis T. S. Yu; Shizhuo Yin, Editor(s)

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