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Proceedings Paper

Design and synthesis of new optical-power-limiting chromophores with enhanced two-photon absorption
Author(s): Charles W. Spangler; El Hadj Elandaloussi; Martin K. Casstevens; Deepak N. Kumar; John F. Weibel; Ryszard Burzynski
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Paper Abstract

There has been considerable recent interest in the design of new organic chromophores, oligomers and polymers with potentially large two-photon cross-sections for a variety of applications that span such diverse areas as photo-dynamic therapy to optical power limiting of nanosecond and picosecond laser pulses. One particularly attractive system is based on poly[p-phenylene vinylene] (PPV) oligomers containing electron-donating substituents. We have recently designed and synthesized several PPV dimers with bis- diphenylamino) donor groups attached to the terminal phenyl rings, and have demonstrated that these materials have very large two-photon cross-sections for nanosecond pulses. It is probable that these enhanced cross-sections are due to excited state absorption following the initial two-photon absorption. We have also examined bis- (diphenylamino)diphenylpolyenes, and more recently extended our design concept to dendrimer structures based on bis- (diphenylamino)stilbene repeat units. Initial studies on the dendrimer structures and bis-(diphenylamino)-PPV dimer reveal extremely large two-photon cross-sections which we have also ascribed to probable excited-state absorption. The efficacy of this design approach will be discussed, as well as projected future design paradigms for even greater TPA enhancement.

Paper Details

Date Published: 4 October 1999
PDF: 6 pages
Proc. SPIE 3798, Power-Limiting Materials and Devices, (4 October 1999); doi: 10.1117/12.363870
Show Author Affiliations
Charles W. Spangler, Montana State Univ./Bozeman (United States)
El Hadj Elandaloussi, Montana State Univ./Bozeman (United States)
Martin K. Casstevens, Laser Photonics Technology, Inc. (United States)
Deepak N. Kumar, Laser Photonics Technology, Inc. (United States)
John F. Weibel, Laser Photonics Technology, Inc. (United States)
Ryszard Burzynski, Laser Photonics Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 3798:
Power-Limiting Materials and Devices
Christopher M. Lawson, Editor(s)

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