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Proceedings Paper

Fabrication of ZnO nanostructure using near-field optical technology
Author(s): Geun Hyoung Lee; Yoh Yamamoto; Motonobu Kourogi; Motoichi Ohtsu
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Paper Abstract

ZnO nanodots have been successfully fabricated on a (001) Al2O3 substrate by photo-enhanced chemical vapor deposition (PE-MOCVD) combined with near-field optical technology. The optical near-field generated from an optical fiber probe tip allowed ZnO dots to selectively grow on the irradiated substrate surface, with a size smaller than the wavelength of the light source (λ=244 nm). The crystallinity and composition of ZnO were evaluated from planar films using x-ray diffraction analysis, optical transmittance and x-ray photoelectron spectroscopy. The planar films were grown using PE-MOCVD with a direct irradiation by an ultraviolet light source without probe tip. Above a deposition temperature of 150°C, stoichiometric ZnO films (R O:Zn=1), strongly the c-axis oriented and exhibiting a band gap of about 3.3 eV were obtained.

Paper Details

Date Published: 22 September 1999
PDF: 8 pages
Proc. SPIE 3791, Near-Field Optics: Physics, Devices, and Information Processing, (22 September 1999); doi: 10.1117/12.363850
Show Author Affiliations
Geun Hyoung Lee, Japan Science and Technology Corp. (Japan)
Yoh Yamamoto, Tokyo Institute of Technology (Japan)
Motonobu Kourogi, Japan Science and Technology Corp. and Tokyo Institute of Technology (Japan)
Motoichi Ohtsu, Japan Science and Technology Corp. and Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 3791:
Near-Field Optics: Physics, Devices, and Information Processing
Suganda Jutamulia; Motoichi Ohtsu; Toshimitsu Asakura, Editor(s)

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