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Proceedings Paper

Carbon fiber composite photomask stage component
Author(s): Brian E. Catanzaro; Jack E. Dyer; David Trost
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Paper Abstract

The semiconductor industry utilizes complex patterning tools to achieve the patterning of fine features. These tools require stiff, lightweight, dimensionally stable components in order to reliably pattern photomasks and wafers. Traditionally, these tools have used metals, ceramics, and low expansion glasses. However, a new class of materials, high performance composites, have demonstrated promise for replacing these materials. This paper discusses the design, manufacturing, and test of a carbon fiber composite stage component of an electron beam lithography tool.

Paper Details

Date Published: 28 September 1999
PDF: 9 pages
Proc. SPIE 3786, Optomechanical Engineering and Vibration Control, (28 September 1999); doi: 10.1117/12.363797
Show Author Affiliations
Brian E. Catanzaro, Composite Optics, Inc. (United States)
Jack E. Dyer, Composite Optics, Inc. (United States)
David Trost, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3786:
Optomechanical Engineering and Vibration Control
Eddy A. Derby; Eddy A. Derby; Colin G. Gordon; Colin G. Gordon; Daniel Vukobratovich; Carl H. Zweben; Daniel Vukobratovich; Paul R. Yoder; Carl H. Zweben, Editor(s)

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