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Proceedings Paper

Principles and software for photolithographic optical system alignment and tolerancing
Author(s): Sergey A. Rodionov; Nikolay B. Voznesensky; Nadezhda D. Tolstoba; Dmitry A. Gavrilin; Georgy I. Tychonchuk
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Paper Abstract

Principles and mathematics for computer aided high precision optical system alignment and tolerancing are discussed as applied to photolithography projection lenses. All aberrations of an optical system including distortion are described by using global polychromatic Zernike polynomial expansion of the wave front aberration, so to optimize the lens quality one has to minimize each coefficient of the expansion. The procedure of aberrations measurement which is based on Hartmann test is discussed and the processing technique which easily offers to define the overfield coma, spherical aberration, distortion and astigmatism is proposed. Least squares method is used to calculate from measured data the aberration coefficients for a real system. After optimum selection of adjustable parameters axial symmetry and decentered aberrations are being compensated separately of each other.

Paper Details

Date Published: 27 September 1999
PDF: 11 pages
Proc. SPIE 3780, Optical Design and Analysis Software, (27 September 1999); doi: 10.1117/12.363775
Show Author Affiliations
Sergey A. Rodionov, St. Petersburg Institute of Fine Mechanics and Optics (Russia)
Nikolay B. Voznesensky, St. Petersburg Institute of Fine Mechanics and Optics (Russia)
Nadezhda D. Tolstoba, St. Petersburg Institute of Fine Mechanics and Optics (Russia)
Dmitry A. Gavrilin, St. Petersburg Institute of Fine Mechanics and Optics (Russia)
Georgy I. Tychonchuk, Planar (Russia)


Published in SPIE Proceedings Vol. 3780:
Optical Design and Analysis Software
Richard C. Juergens, Editor(s)

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