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Proceedings Paper

Edge diffraction in Monte Carlo ray tracing
Author(s): Edward R. Freniere; G. Groot Gregory; Richard A. Hassler
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Paper Abstract

Monte Carlo ray tracing programs are now being used to solve many optical analysis problems in which the entire optomechanical system must be considered. In many analyses, it is desired to consider the effects of diffraction by mechanical edges. Smoothly melding the effects of diffraction, a wave phenomenon, into a ray-tracing program is a significant technical challenge. This paper discusses the suitability of several methods of calculating diffraction for use in ray tracing programs. A method based on the Heisenberg Uncertainty Principle was chosen for use in TracePro, a commercial Monte Carlo ray tracing program, and is discussed in detail.

Paper Details

Date Published: 27 September 1999
PDF: 7 pages
Proc. SPIE 3780, Optical Design and Analysis Software, (27 September 1999); doi: 10.1117/12.363773
Show Author Affiliations
Edward R. Freniere, Lambda Research Corp. (United States)
G. Groot Gregory, Lambda Research Corp. (United States)
Richard A. Hassler, Lambda Research Corp. (United States)

Published in SPIE Proceedings Vol. 3780:
Optical Design and Analysis Software
Richard C. Juergens, Editor(s)

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