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Proceedings Paper

Microlens arrays based on chalcogenide glass resists using the proximity microlithography method
Author(s): Salman Noach; M. Manevich; Matvei Klebanov; Victor Lyubin; Naftali Paul Eisenberg
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Paper Abstract

A simple microlens array fabrication process based on chalcogenide glass As-Se and As-S photoresists is described. Specific properties of chalcogenide photoresists important for microlenses preparation and the parameters of fabricated spherical and cylindrical microlens arrays are measured and discussed.

Paper Details

Date Published: 17 September 1999
PDF: 5 pages
Proc. SPIE 3778, Gradient Index, Miniature, and Diffractive Optical Systems, (17 September 1999); doi: 10.1117/12.363753
Show Author Affiliations
Salman Noach, Jerusalem College of Technology (Israel)
M. Manevich, Jerusalem College of Technology (Israel)
Matvei Klebanov, Ben Gurion Univ. of the Negev (Israel)
Victor Lyubin, Ben Gurion Univ. of the Negev (Israel)
Naftali Paul Eisenberg, Jerusalem College of Technology (Israel)


Published in SPIE Proceedings Vol. 3778:
Gradient Index, Miniature, and Diffractive Optical Systems
Alan D. Kathman, Editor(s)

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