Share Email Print
cover

Proceedings Paper

Application of liquid crystal techniques with image processing
Author(s): Satoshi Suzuki; Takaaki Numajiri; Koji Saso; Naoki Yoshida; Keiji Fujimoto
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Liquid crystal method is one of the techniques for failure analysis. This technique is well known way to identify a failure point on a silicon integrated circuit. However, the tendency of LSI devices in recent years towards smaller feature size, higher density, lower electric power and larger chip size has created a demand for improvement of this technique towards higher accuracy and increased reliability of failure point localization. In this case, we developed a new technique for applying the liquid crystal method. With this technique, we improved four aspects of the analysis: (1) Automatic adjustment of the temperature towards the transference point of the liquid crystal by image processing. (2) Automatic display of the 'hot spot' by image processing. (3) Automatic oscillation of the applied voltage for enhanced visibility of the current leakage point. (4) Minute control of the temperature from the reverse side of the package using a Peltier element. As a result of this improvement, we could realize improved accuracy for the liquid crystal analysis and reliability of failure point localization. This thesis reports how this technique can be established as a working technique for routine failure analysis, with a practical detection sensitivity of about 1 (mu) W. This method should be called LCIP (Liquid Crystal with Image Processing method).

Paper Details

Date Published: 27 August 1999
PDF: 6 pages
Proc. SPIE 3884, In-Line Methods and Monitors for Process and Yield Improvement, (27 August 1999); doi: 10.1117/12.361358
Show Author Affiliations
Satoshi Suzuki, NEC Corp. (Japan)
Takaaki Numajiri, NEC Corp. (Japan)
Koji Saso, NEC Corp. (Japan)
Naoki Yoshida, Nippon Scientific Co., Ltd. (Japan)
Keiji Fujimoto, Nippon Scientific Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 3884:
In-Line Methods and Monitors for Process and Yield Improvement
Sergio A. Ajuria; Jerome F. Jakubczak, Editor(s)

© SPIE. Terms of Use
Back to Top