Share Email Print
cover

Proceedings Paper

Asymmetric alignment mark compensation
Author(s): John D. Rose; Alejandro Velez; Shephen Berger
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Metal deposition equipment typically sputter more from the center of the target than the edge. Features on the wafer can cause a shadowing effect where the metal accumulates on the surfaces that are more incident. This will result in an apparent image shift if viewed from the top. The misplacement will be minimized near the center of the wafer and will be worse toward the edge. Since the actual position of the alignment mark is not visible, only the misplaced image as viewed from the metal covering the mark, direct inline alignment measurement is not possible with optical or SEM methods. Cross sections show that the misplacement is linear and symmetric about the wafer center and takes the form of a scaling misalignment. When overlay is measured on a wafer using traditional means, the scaling correction is added mathematically to the data to compensate for the inability of the tool to measure the actual alignment. Using this technique, standard overlay tools can be used to measure alignment on opaque films.

Paper Details

Date Published: 3 September 1999
PDF: 6 pages
Proc. SPIE 3882, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V, (3 September 1999); doi: 10.1117/12.361295
Show Author Affiliations
John D. Rose, Sony Electronics, Inc. (United States)
Alejandro Velez, Sony Electronics, Inc. (United States)
Shephen Berger, Sony Electronics, Inc. (United States)


Published in SPIE Proceedings Vol. 3882:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V
Anthony J. Toprac; Kim Dang, Editor(s)

© SPIE. Terms of Use
Back to Top