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Proceedings Paper

SCALPEL mask blank fabrication
Author(s): Thomas E. Saunders; Myrtle I. Blakey; Carlos Caminos; Gregory R. Bogart; Reginald C. Farrow; Chester S. Knurek; Avi Kornblit; James Alexander Liddle; Anthony E. Novembre; Milton L. Peabody
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Paper Abstract

The SCALPEL lithography system combines the advantages of high resolution and wide process latitude of electron beam lithography with the throughput of a projection system. The SCALPEL approach has the potential to meet the minimum feature size requirements of future IC generations down to 50 nm.

Paper Details

Date Published: 30 August 1999
PDF: 8 pages
Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); doi: 10.1117/12.361228
Show Author Affiliations
Thomas E. Saunders, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Carlos Caminos, Lucent Technologies/Bell Labs. (United States)
Gregory R. Bogart, Lucent Technologies/Bell Labs. (United States)
Reginald C. Farrow, Lucent Technologies/Bell Labs. (United States)
Chester S. Knurek, Lucent Technologies/Bell Labs. (United States)
Avi Kornblit, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Anthony E. Novembre, Lucent Technologies/Bell Labs. (United States)
Milton L. Peabody, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3874:
Micromachining and Microfabrication Process Technology V
James H. Smith; Jean Michel Karam, Editor(s)

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