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Proceedings Paper

Fabrication of counter electrodes for scanning atomic probe
Author(s): Andrew Campitelli; Hocine Ziad; Frank Rogge; Wilfried Vandervorst; Christiaan Baert; Min Huang; Alfred Cerezo
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Paper Abstract

This paper reports on the fabrication of innovative counter electrodes for the development of a new Scanning Atom Probe (SAP) instrument. A process using thick spin-on dielectrics, deep reactive ion etching and photolithography has been developed for the realization of the counter electrodes. The novel structure is a two-terminal device in the form of a hollow cone shape, with tow electrodes separated by a dielectric layer. Different counter electrode design versions are presented, with the focus on the results for the first iteration. Electrical testing of the insulating layer is performed to investigate the material suitability for the operating conditions of the SAP instrument. Details regarding the design and fabrication procedure for the different designs, with emphasis on the process flow for the non standard steps, are also presented.

Paper Details

Date Published: 30 August 1999
PDF: 12 pages
Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); doi: 10.1117/12.361214
Show Author Affiliations
Andrew Campitelli, IMEC (Belgium)
Hocine Ziad, IMEC (Belgium)
Frank Rogge, IMEC (Belgium)
Wilfried Vandervorst, IMEC (Belgium)
Christiaan Baert, IMEC (Belgium)
Min Huang, Univ. of Oxford (United Kingdom)
Alfred Cerezo, Univ. of Oxford (United Kingdom)


Published in SPIE Proceedings Vol. 3874:
Micromachining and Microfabrication Process Technology V
James H. Smith; Jean Michel Karam, Editor(s)

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