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Proceedings Paper

Laser-induced damage threshold of thin film in a gas chamber
Author(s): Feng Huang; Qihong Lou; Hongyi Gao; Jinxing Dong; Yunrong Wei
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Paper Abstract

The damage threshold of ZrO2/SiO2 and HfO2/SiO2 thin films was investigated in gas chamber (with oxygen gas, air, helium gas or vacuum condition) by using a scattering detector system. The experimental results show that the damage threshold is increased about 20% in oxygen gas ambient. The mechanism of these phenomena is discussed.

Paper Details

Date Published: 8 September 1999
PDF: 5 pages
Proc. SPIE 3862, 1999 International Conference on Industrial Lasers, (8 September 1999); doi: 10.1117/12.361204
Show Author Affiliations
Feng Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Qihong Lou, Shanghai Institute of Optics and Fine Mechanics (China)
Hongyi Gao, Shanghai Institute of Optics and Fine Mechanics (China)
Jinxing Dong, Shanghai Institute of Optics and Fine Mechanics (China)
Yunrong Wei, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 3862:
1999 International Conference on Industrial Lasers
Fuxi Gan; Horst Weber; Zaiguang Li; Qingming Chen, Editor(s)

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