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Proceedings Paper

Modeling of excimer-laser direct-projection deep etching of photoresist and its application
Author(s): Beijun Shen; Runwen Wang
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Paper Abstract

A model of laser projection ablation for micropatterning on polymers is established by analyzing the optical imaging features and the UV laser interaction with polymers. This model is applied to explain the experimental phenomenon such as ablated pattern size stability and the taper angle of pattern edge successfully.

Paper Details

Date Published: 8 September 1999
PDF: 5 pages
Proc. SPIE 3862, 1999 International Conference on Industrial Lasers, (8 September 1999); doi: 10.1117/12.361104
Show Author Affiliations
Beijun Shen, Shanghai Institute of Optics and Fine Mechanics (China)
Runwen Wang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 3862:
1999 International Conference on Industrial Lasers
Fuxi Gan; Horst Weber; Zaiguang Li; Qingming Chen, Editor(s)

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