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Proceedings Paper

New approach for nonsilicon-micromachined three-dimensional multilevel diffractive optical elements
Author(s): Guangya Zhou; Yi-Xin Chen; Mingsheng Zhang; Xiaolin Zhao; Zongguang Wang
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Paper Abstract

In this paper, we developed a nonsilicon surface- micromachining technique that uses a thick photoresist film and a spattered copper layer as two sacrificial layers and uses the electroplated ferronickel (FeNi) as the structure material. The proposed nonsilicon micromachining process is simpler, with relatively low temperature, and more flexible for various materials. By using such technique, silica or glass can be used as an optical material. Several out-of- plane multilevel diffractive optical elements (DOE's) including gratings, phase Fresnel lenses and some other optical components supported by FeNi microstructures are successfully constructed on the silicon wafer. Those DOE's are fabricated by several steps both of photolithography and reactive ion etching on the spattered silica layer. This technology offers a new approach to fabricate high quality phase micro-optical elements for free-space integrated micro-optics and other applications.

Paper Details

Date Published: 31 August 1999
PDF: 8 pages
Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360536
Show Author Affiliations
Guangya Zhou, Shanghai Jiao Tong Univ. (Singapore)
Yi-Xin Chen, E-Tek Dynamics, Inc. (China)
Mingsheng Zhang, Shanghai Jiao Tong Univ. (China)
Xiaolin Zhao, Shanghai Jiao Tong Univ. (China)
Zongguang Wang, Shanghai Jiao Tong Univ. (China)

Published in SPIE Proceedings Vol. 3879:
Micromachine Technology for Diffractive and Holographic Optics
Sing H. Lee; J. Allen Cox, Editor(s)

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