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Proceedings Paper

Potential of dry etching for the fabrication of fused silica micro-optical elements
Author(s): Philippe Nussbaum; Kenneth J. Weible; Markus Rossi; Hans Peter Herzig
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Paper Abstract

We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch masks. The shaping of optimized profiles is also presented to generate microlenses which are aspheric, or which have a low numerical aperture.

Paper Details

Date Published: 31 August 1999
PDF: 8 pages
Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360533
Show Author Affiliations
Philippe Nussbaum, Univ. of Neuchatel (Switzerland)
Kenneth J. Weible, WeibleOptech (Switzerland)
Markus Rossi, CSEM Zuerich (Switzerland)
Hans Peter Herzig, Univ. of Neuchatel (Switzerland)


Published in SPIE Proceedings Vol. 3879:
Micromachine Technology for Diffractive and Holographic Optics
Sing H. Lee; J. Allen Cox, Editor(s)

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