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Proceedings Paper

Noise reduction in the recording of holographic masks in photoresist
Author(s): Lucila H. D. Cescato; Leandro L. Soares; Elso Luiz Rigon; Marco A.R. Alves; Edmundo S. Braga
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Paper Abstract

The lithography of gratings or structures using photoresist holographic masks is very critical, in particular when high selectivity etching processes were employed. In this paper we study the effect of the mask profile and of the phase perturbations during the holographic exposure in the noise of the photoresist masks. It is shown that the use of appropriate conditions of development and exposure may reduce significantly this noise allowing the recording of high aspect ratio structures and the use of selective deposition techniques.

Paper Details

Date Published: 31 August 1999
PDF: 9 pages
Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360529
Show Author Affiliations
Lucila H. D. Cescato, Univ. Estadual de Campinas (Brazil)
Leandro L. Soares, Univ. Estadual de Campinas (Brazil)
Elso Luiz Rigon, Univ. Estadual de Campinas (Brazil)
Marco A.R. Alves, Univ. Estadual de Campinas (Brazil)
Edmundo S. Braga, Univ. Estadual de Campinas (Brazil)


Published in SPIE Proceedings Vol. 3879:
Micromachine Technology for Diffractive and Holographic Optics
Sing H. Lee; J. Allen Cox, Editor(s)

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