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Proceedings Paper

Automated-interference-lithography-based systems for generation of submicron-feature size patterns
Author(s): Douglas S. Hobbs; Bruce D. McLeod; Adam F. Kelsey; Mark A. Leclerc; Ernest Sabatino
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Paper Abstract

Interferometric lithography is a maturing technology for patterning large area, periodic sub-micron features. The interference of two or more coherent optical waves is recorded in photoresist to produce a variety of structures including gratings, holes, posts, cones, and grids. This lithographic technique allows maskless patterning of large area substrates using short exposure times. Applications for periodic patterns include distributed feedback lasers, field emission displays, liquid crystal displays, advanced data storage applications, optical gratings, metrology standards, and sub-wavelength structures. Our work is motivated by interest in bringing interferometric patterning out of research laboratories and into mainstream production facilities for high volume applications, by automating and simplifying the exposure process. The concept and operational principles of two automated interference lithography systems, the HLS model 1000, and the HLS model PC2, are introduced.

Paper Details

Date Published: 31 August 1999
PDF: 12 pages
Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360517
Show Author Affiliations
Douglas S. Hobbs, Holographic Lithography Systems, Inc. (United States)
Bruce D. McLeod, Holographic Lithography Systems, Inc. (United States)
Adam F. Kelsey, Holographic Lithography Systems, Inc. (United States)
Mark A. Leclerc, Holographic Lithography Systems, Inc. (United States)
Ernest Sabatino, Holographic Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3879:
Micromachine Technology for Diffractive and Holographic Optics
Sing H. Lee; J. Allen Cox, Editor(s)

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