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Proceedings Paper

New UV-capable photomask CD metrology tool
Author(s): Gerhard W.B. Schlueter; Hans-Juergen Brueck; Sebastian Birkenmayer; Guenther Falk; Gerd Scheuring; Lars Walden; Sigrid Lehnigk
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Paper Abstract

With continuously shrinking device structure sizes the photomask suppliers are facing increasing linewidth metrology control requirements. Therefore it is becoming more and more important for equipment suppliers to provide mask metrology tools capable of measuring 0.5 micrometer and smaller critical dimension (CD) features with high accuracy and repeatability, while offering high throughput for systems to be used in the production environment. CD measurement results obtained on the Leica LWM 250UV will be presented showing not only the considerably improved resolution power and measurement accuracy but also an extension of the linearity range to smaller feature sizes using UV light of 365 nm (I-line) instead of white light for illumination in transmitted mode. Results obtained after a system calibration against SEM measurement data show a further extension of the linearity regime. The higher lateral resolution of I-line compared to white light measurements also leads to a CD range value reduction for long term repeatability.

Paper Details

Date Published: 25 August 1999
PDF: 7 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360234
Show Author Affiliations
Gerhard W.B. Schlueter, Leica Microsystems Wetzlar GmbH (Germany)
Hans-Juergen Brueck, MueTec GmbH (Germany)
Sebastian Birkenmayer, MueTec GmbH (Germany)
Guenther Falk, MueTec GmbH (United States)
Gerd Scheuring, MueTec GmbH (Germany)
Lars Walden, MueTec GmbH (Germany)
Sigrid Lehnigk, Submicron Technologies GmbH (Germany)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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