Share Email Print

Proceedings Paper

Evaluation method of 0.15- to 0.25-um advanced reticle inspection system
Author(s): Andre Wang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Reticle inspection has been critically important for the sub- quarter micron generation IC industry. A good mask inspection tool has to provide enough sensitivity to capture all types of printable defects while avoids false alarms that generate production issues. It is important to develop a standard evaluation method to test the capability of different inspection machines. In this paper, we will discuss our standard evaluation method for new reticle inspection systems. A standard test pattern has been designed. Test results on a KLA 303 system will be displayed.

Paper Details

Date Published: 25 August 1999
PDF: 9 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360231
Show Author Affiliations
Andre Wang, Taiwan Mask Corp. (Taiwan)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top