Share Email Print
cover

Proceedings Paper

Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices
Author(s): Shinji Yamaguchi; Hideki Kanai; Haruki Komano; Hideaki Sakurai; Takehiro Kondo; Masamitsu Itoh; Ichiro Mori; Iwao Higashikawa
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Defect specifications were studied for 0.200 and 0.175 micrometer rule memory cell patterns. Furthermore, we evaluated whether current inspection systems were capable of satisfying the defect specifications. For our evaluation, test masks with programmed defects in 0.200 and 0.175 micrometer rule memory cell patterns were fabricated using a variable shaped electron beam writing system and reactive ion etching. Recently, 0.250 micrometer rule devices have entered the mass- production phase using the defect specification based on the SIA roadmap. Accordingly, we assumed that the ratio of CD variations, corresponding to the defect size based on the SIA roadmap, to nominal sizes has no influence upon action of devices for 0.250 micrometer rule devices. Then, we also assumed that the ratio of CD variations has no influence upon action of not only 0.250 micrometer rule devices but also 0.200 and 0.175 micrometer rule devices. For 0.200 and 0.175 micrometer rule memory cell patterns, defect specifications were obtained by lithography simulations and exposure experiments for the criteria of the ratio of CD variations based on the assumption. We also evaluated whether current inspection systems were capable of satisfying the defect specifications.

Paper Details

Date Published: 25 August 1999
PDF: 11 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360229
Show Author Affiliations
Shinji Yamaguchi, Toshiba Corp. (Japan)
Hideki Kanai, Toshiba Corp. (Japan)
Haruki Komano, Toshiba Corp. (Japan)
Hideaki Sakurai, Toshiba Corp. (Japan)
Takehiro Kondo, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Ichiro Mori, Toshiba Corp. (Japan)
Iwao Higashikawa, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top