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Proceedings Paper

Novel inspection system with design rule check for high-accuracy reticles
Author(s): Takayoshi Matsuyama; Kenichi Kobayashi; Daikichi Awamura; Katsuyoshi Nakashima; Yasunori Hada
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Paper Abstract

A pattern defect inspection system (8MD93R) that features a new concept has been developed. The performance of the design rule check function (DRCF) which this inspection system features was evaluated using a test reticle with a special program defect. As a result, it was confirmed that DRCF made it possible to put pattern inspection that is free from false defects into practical use. Also, we determined the relationship between the image processing accuracy required for DRCF and the reticle defect detection performance. It was confirmed that DRCF could also be used to detect general reticle pattern defects and make an overlay check for a reticle and a reticle of different layer pattern.

Paper Details

Date Published: 25 August 1999
PDF: 9 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360228
Show Author Affiliations
Takayoshi Matsuyama, Fujitsu Ltd. (Japan)
Kenichi Kobayashi, Fujitsu Ltd. (Japan)
Daikichi Awamura, Lasertec Corp. (Japan)
Katsuyoshi Nakashima, Lasertec Corp. (Japan)
Yasunori Hada, Lasertec Corp. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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