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Proceedings Paper

New mask blank handling system for the advanced electron-beam writer EX-11
Author(s): Shusuke Yoshitake; Kenji Ooki; Yoji Ogawa; Katsuhito Ogura; Teruaki Yamamoto; Ryoichi Hirano; Masaki Toriumi; Toru Tojo
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Paper Abstract

Meeting the latest requirements of aggressive users for advanced masks for optical lithography will be difficult. In addition, improving the productivity and throughput of advanced masks with high-density pattern data is necessary. To overcome these hurdles, Toshiba and Toshiba Machine have developed a new advanced mask writer, the EX-11, shown in Figure 1. The EX-11 takes measures against airborne contamination before drawing is started. It also employs a standard mechanical interface (SMIF) based on the concept of local cleaning technology. This paper describes the design concept of the new mask blank handling system for the EX-11, and the efficiency of these measures was confirmed by the experimental results.

Paper Details

Date Published: 25 August 1999
PDF: 10 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360222
Show Author Affiliations
Shusuke Yoshitake, Toshiba Corp. (Japan)
Kenji Ooki, Toshiba Corp. (Japan)
Yoji Ogawa, Toshiba Corp. (Japan)
Katsuhito Ogura, Toshiba Machine Co., Ltd. (Japan)
Teruaki Yamamoto, Toshiba Machine Co., Ltd. (Japan)
Ryoichi Hirano, Toshiba Machine Co., Ltd. (Japan)
Masaki Toriumi, Toshiba Machine Co., Ltd. (Japan)
Toru Tojo, Toshiba Machine Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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