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Proceedings Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Author(s): Toru Tojo; Ryoji Yoshikawa; Yoji Ogawa; Shuichi Tamamushi; Yoshiaki Hattori; Souji Koikari; Hideo Kusakabe; Takayuki Abe; Munehiro Ogasawara; Kiminobu Akeno; Hirohito Anze; Kiyoshi Hattori; Ryoichi Hirano; Shusuke Yoshitake; Tomohiro Iijima; Kenji Ohtoshi; Kazuto Matsuki; Naoharu Shimomura; Noboru Yamada; Hitoshi Higurashi; Noriaki Nakayamada; Yuuji Fukudome; Shigehiro Hara; Eiji Murakami; Takashi Kamikubo; Yasuo Suzuki; Susumu Oogi; Mitsuko Shimizu; Shinsuke Nishimura; Hideyuki Tsurumaki; Satoshi Yasuda; Kenji Ooki; Kiyomi Koyama; Susumu Watanabe; Mitsuhiro Yano; Hiroaki Suzuki; Hiroshi Hoshino; Masaki Toriumi; Osamu Watanabe; Kazuo Tsuji; Mitsunobu Katayama; Seiichi Tsuchiya; Kimio Suzuki; Shiro Kurasawa; Kazuyuki Okuzono; Hirokazu Yamada; Koji Handa; Yoshio Suzuki; Tetsu Akiyama; Yoshiaki Tada; Akira Noma; Tadahiro Takigawa
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Paper Abstract

Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.

Paper Details

Date Published: 25 August 1999
PDF: 10 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360219
Show Author Affiliations
Toru Tojo, Toshiba Corp. (Japan)
Ryoji Yoshikawa, Toshiba Corp. (Japan)
Yoji Ogawa, Toshiba Corp. (Japan)
Shuichi Tamamushi, Toshiba Corp. (Japan)
Yoshiaki Hattori, Toshiba Corp. (Japan)
Souji Koikari, Toshiba Corp. (Japan)
Hideo Kusakabe, Toshiba Corp. (Japan)
Takayuki Abe, Toshiba Corp. (Japan)
Munehiro Ogasawara, Toshiba Corp. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)
Hirohito Anze, Toshiba Corp. (Japan)
Kiyoshi Hattori, Toshiba Corp. (Japan)
Ryoichi Hirano, Toshiba Corp. (Japan)
Shusuke Yoshitake, Toshiba Corp. (Japan)
Tomohiro Iijima, Toshiba Corp. (Japan)
Kenji Ohtoshi, Toshiba Corp. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Naoharu Shimomura, Toshiba Corp. (Japan)
Noboru Yamada, Toshiba Corp. (Japan)
Hitoshi Higurashi, Toshiba Corp. (Japan)
Noriaki Nakayamada, Toshiba Corp. (Japan)
Yuuji Fukudome, Toshiba Corp. (Japan)
Shigehiro Hara, Toshiba Corp. (Japan)
Eiji Murakami, Toshiba Corp. (Japan)
Takashi Kamikubo, Toshiba Corp. (Japan)
Yasuo Suzuki, Toshiba Corp. (Japan)
Susumu Oogi, Toshiba Corp. (Japan)
Mitsuko Shimizu, Toshiba Corp. (Japan)
Shinsuke Nishimura, Toshiba Corp. (Japan)
Hideyuki Tsurumaki, Toshiba Corp. (Japan)
Satoshi Yasuda, Toshiba Corp. (Japan)
Kenji Ooki, Toshiba Corp. (Japan)
Kiyomi Koyama, Toshiba Corp. (Japan)
Susumu Watanabe, Toshiba Corp. (Japan)
Mitsuhiro Yano, Toshiba Corp. (Japan)
Hiroaki Suzuki, Toshiba Corp. (Japan)
Hiroshi Hoshino, Toshiba Machine Co., Ltd. (Japan)
Masaki Toriumi, Toshiba Machine Co., Ltd. (Japan)
Osamu Watanabe, Toshiba Machine Co., Ltd. (Japan)
Kazuo Tsuji, Toshiba Machine Co., Ltd. (Japan)
Mitsunobu Katayama, Toshiba Machine Co., Ltd. (Japan)
Seiichi Tsuchiya, Toshiba Machine Co., Ltd. (Japan)
Kimio Suzuki, Toshiba Machine Co., Ltd. (Japan)
Shiro Kurasawa, Toshiba Machine Co., Ltd. (Japan)
Kazuyuki Okuzono, Toshiba Machine Co., Ltd. (Japan)
Hirokazu Yamada, Toshiba Machine Co., Ltd. (Japan)
Koji Handa, Toshiba Machine Co., Ltd. (Japan)
Yoshio Suzuki, Toshiba Machine Co., Ltd. (Japan)
Tetsu Akiyama, Toshiba Machine Co., Ltd. (Japan)
Yoshiaki Tada, Toshiba Machine Co., Ltd. (Japan)
Akira Noma, Toshiba Machine Co., Ltd. (Japan)
Tadahiro Takigawa, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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