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Proceedings Paper

Enhanced pattern fidelity experiment for subquarter-micron design rule mask making
Author(s): Do Yun Kim; Cheol Shin; H. S. Jung; Junsik S. Cho
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Paper Abstract

This paper discuss the resist profile, Resolution and the pattern fidelity of sub-micron feature in each PBS,ZEP-7000, CAR (chemical amplify resist) process that is reviewed the SEM (Scanning Electron Microscope) analysis. And it is to compare the lithographic performance of Raster scan e-beam writer (10 Kv) and Vector scan E-beam writer (50 Kv), variable shape Beam with different Electron beam resist as PBS, the most Popular Resist in many users, ZEP-7000 and CAR (Chemical amplify resist) which shows different process characteristic in Dose sensitivity, process latitude, stability.

Paper Details

Date Published: 25 August 1999
PDF: 14 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360207
Show Author Affiliations
Do Yun Kim, DuPont Photomasks Korea Ltd. (South Korea)
Cheol Shin, DuPont Photomasks Korea Ltd. (South Korea)
H. S. Jung, DuPont Photomasks Korea Ltd. (South Korea)
Junsik S. Cho, DuPont Photomasks Korea Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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