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Proceedings Paper

Comparison of mulitpass gray strategy and conventional writing method
Author(s): Ichiro Kagami; Masaaki Koyama; Hiroichi Kawahira
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Paper Abstract

A small design address size on 1 X below 5 nm is one of the requirement for 0.18 micrometers masks for critical layers. To realize the small address size on raster scan electron beam systems, the improvement of throughput is a key issue. So, multipass gray (MPG) writing strategy was introduced for the 0.18 micrometers generation masks. Characteristics of MPG writing strategy are that (1) using larger writing address unit than the input data address and (2) gray level writing to modulate an electron beam (EB) dosage. In this paper, the evaluation of critical dimension (CD) controllability for the MPG writing strategy will be presented for a positive EB resist and a chemically amplified negative EB resist with a Cr dry etch process. Comparisons of such as corner rounding and throughput between MPG and conventional writing method is also reported.

Paper Details

Date Published: 25 August 1999
PDF: 10 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360205
Show Author Affiliations
Ichiro Kagami, Sony Corp. (Japan)
Masaaki Koyama, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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