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Proceedings Paper

Improvement of OPC data processing for photomask fabrication
Author(s): Nobuhito Toyama; Hiroyuki Miyashita; Kouji Ishida
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Paper Abstract

For common approach for low k1-factor process, or just shrink LSI chip size, Optical Proximity effect Correction (OPC) has been getting popular. Though only the OPC effect tends to be discussed at design or wafer process stages, the OPC data processing or OPC photomask writing should be also discussed. Through many experiments with fabricated OPC reticles using many kinds of OPC data, the pursuit of reasonable OPC has been continuing. Then practical design grid for reasonable OPC that will improve data processing, output volume and photomask writing time keeping with regardful OPC effect is discussed.

Paper Details

Date Published: 25 August 1999
PDF: 8 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360196
Show Author Affiliations
Nobuhito Toyama, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Ishida, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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