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Proceedings Paper

Development of a total CAD system for alternate-type PSMs with optical proximity correction
Author(s): Tamae Haruki; Ryo Tsujimura; Junji Tomida; Yasuhide Machida; Satoru Asai; Isamu Hanyu
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Paper Abstract

Alternate-type phase shifting masks (PSMs) have been investigated as a methods used to fabricate 0.18 micrometer and smaller rule devices. For practical use, an automatic shifter placement CAD, a DRC for the indicating errors in rules for alternate-type PSMs, and an optical proximity correction (OPC) tool are indispensable. We previously reported on the algorithm for the shifter placement and the DRC for alternate-type PSMs and the OPC tool. We now report that these tools enhance the practical CAD system, fully supporting the entire process from designing the physical layout to adjusting the mask patterns in order to prevent the optical proximity effects. First, the phase shifting patterns are generated automatically. Next, the DRC tool indicates rule errors for the design of alternate-type PSMs. The Designers must modify the indicated portions and replace the shifters or DRC until there are no errors. In order to be more general than our previous tools, it is important that the delivering data between the layout editor and the program be GDS formatted data. Following the designing of the PSMs, the OPC tool, which was developed on parallel processor units, adjusts the designed patterns. Our system was actually used to fabricate 0.18 micrometer rule full-chip devices, and thus we confirmed that the computing performance is satisfactorily practical and that the CAD system shows promises as a means of fabricating rule devices beyond current rules.

Paper Details

Date Published: 25 August 1999
PDF: 11 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360194
Show Author Affiliations
Tamae Haruki, Fujitsu Ltd. (Japan)
Ryo Tsujimura, Fujitsu Ltd. (Japan)
Junji Tomida, Fujitsu VLSI Ltd. (Japan)
Yasuhide Machida, Fujitsu Ltd. (Japan)
Satoru Asai, Fujitsu Ltd. (Japan)
Isamu Hanyu, Fujitsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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