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Proceedings Paper

Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks
Author(s): Kyoji Nakajo; Junya Sakemi; Hiroshi Fukuda; Tsuneo Terasawa; Norio Hasegawa; Eiji Tsujimoto
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Paper Abstract

An automated method has been developed to generate auxiliary patterns to cancel unexpected images formed by attenuate phase-shift masks. This method consists of checking the area where sidelobes overlap and generating the auxiliary patterns. The sidelobes are approximated by polygons and the degree of overlap is checked. Taking overlap degree information into account, auxiliary pattern size is defined and automatically generated. Practicality of this method is confirmed by application to a medium-scale layout of 105 patterns.

Paper Details

Date Published: 25 August 1999
PDF: 8 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360193
Show Author Affiliations
Kyoji Nakajo, Hitachi ULSI Systems Co., Ltd. (Japan)
Junya Sakemi, Hitachi ULSI Systems Co., Ltd. (Japan)
Hiroshi Fukuda, Hitachi, Ltd. (Japan)
Tsuneo Terasawa, Hitachi, Ltd. (Japan)
Norio Hasegawa, Hitachi, Ltd. (Japan)
Eiji Tsujimoto, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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