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Proceedings Paper

Enhancement of hierarchical mask data design system (PROPHET)
Author(s): Takahiro Watanabe; Eiji Tsujimoto; Keiji Maeda; Hiroshi Fukuda
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Paper Abstract

Several new features have been added to the aerial image simulation function of PROPHET due to process engineers' request for more precise evaluation of simulation results. In the previous version, only contour lines of light intensity were shown in the layout editor window. This new version of PROPHET can show a cross sectional display of two dimensional light intensity on any user specified line segment with the aid of layout editor. Line width measurement, light intensity measurement and multiple exposure simulation can be done by utilizing the two dimensional light intensity data file previously used only to draw contour lines. The optimal coherent approximation (OCA) reduces simulation time to 1/50 in high sigma region. A Fickian diffusion of the light intensity profile and a simple resist processing model gives more precise simulation results.

Paper Details

Date Published: 25 August 1999
PDF: 9 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360191
Show Author Affiliations
Takahiro Watanabe, Hitachi, Ltd. (Japan)
Eiji Tsujimoto, Hitachi, Ltd. (Japan)
Keiji Maeda, Hitachi ULSI Systems Co., Ltd. (Japan)
Hiroshi Fukuda, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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