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Proceedings Paper

Micro-optical silicon elements fabricated by wet chemical etching
Author(s): Joachim Fruehauf; Birgit Hannemann
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Paper Abstract

Silicon is the mainly used material in the microtechnique and the crystal orientation wet chemical etching is a well known technological process in the production of microtechnical elements. The defined crystallographic faces prepared during etching and the shapes which can be created by combinations of them show properties of interest for applications in micro-optical elements. This will be demonstrated. First a systematic overview is given related to applications like fiber grooves, mirrors, beam splitters, gratings and prisms. As introduction in the crystal orientation dependent etching some basics to the process and design will be described which can be completed by many referencing. Properties like roughness, shape and inclination of the etched faces which are of relevance for optical applications are investigated. At last some special elements are described.

Paper Details

Date Published: 6 September 1999
PDF: 11 pages
Proc. SPIE 3739, Optical Fabrication and Testing, (6 September 1999); doi: 10.1117/12.360147
Show Author Affiliations
Joachim Fruehauf, Chemnitz Univ. of Technology (Germany)
Birgit Hannemann, Gesellschaft fuer Mikroelektronikanwendung Chemnitz (Germany)

Published in SPIE Proceedings Vol. 3739:
Optical Fabrication and Testing
Roland Geyl; Jonathan Maxwell, Editor(s)

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