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Proceedings Paper

Design and fabrication of miniaturized dielectric interference coatings
Author(s): Marcus Frank; Norbert Kaiser; Uwe B. Schallenberg
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Paper Abstract

Miniaturized interference filters were designed and fabricated using three different manufacturing technologies. Applying micro-milled ceramic masks during the coating processes different arrays of interference filters with 1 mm lateral feature size were arranged on a 3-inch Si-substrate. The spectral sensitivity of receiver cells has been modified by direct coating using ion assisted deposition (IAD) at low temperature. IAD-processes also allow the application of microlithographic masks, which are removable by organic solvents after the deposition process. As an example three different miniaturized interference filters were arranged side by side with lateral filter dimensions of a few tens of microns. A combination of coating processes, microlithographic masking procedures, and reactive ion etching made it possible to arrange three different stripe filters with minimum filter features of about 5 micrometers side by side.

Paper Details

Date Published: 7 September 1999
PDF: 9 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360121
Show Author Affiliations
Marcus Frank, Fraunhofer IOF (Germany)
Norbert Kaiser, Fraunhofer IOF (Germany)
Uwe B. Schallenberg, mso jena Mikroschichtoptik GmbH (Germany)

Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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