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Proceedings Paper

Polarimetric phase measurement for the detection of contaminants on optical surfaces
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Paper Abstract

It has been shown that measuring the polarimetric phase of the field scattered from a thin film multilayer gives information on the origin of scattering. Numerous numerical simulations have shown that the behavior of the polarimetric phase can be used to separate surface and bulk scattering. In the case of stacks with correlated interfaces the polarimetric phase depend only on the origin of scattering, whatever the microstructural parameters. Slight deviations from vertical correlation within the stack lead to ripples in the polarimetric phase, that can be observed experimentally. Moreover in certain cases second order effects, due for example to localized defects, can lead to depolarization. This phenomenon has strong influence on the polarimetric phase. This can be used to detect contamination of the surface. In our communication we will present some experimental results that show that the origin of scattering can be determined.

Paper Details

Date Published: 7 September 1999
PDF: 9 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360107
Show Author Affiliations
Carole Deumie, Ecole Nationale Superieure de Physique de Marseille (France)
Nathalie Destouches, Ecole Nationale Superieure de Physique de Marseille (France)
Hugues Giovannini, Ecole Nationale Superieure de Physique de Marseille (France)
Claude Amra, Ecole Nationale Superieure de Physique de Marseille (France)


Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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