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Proceedings Paper

Laser damage testing of SiO2 and HfO2 thin films
Author(s): M. Di Giulio; Marco Alvisi; Maria Rita Perrone; Maria Lucia Protopapa; Antonio Valentini; Lorenzo Vasanelli
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Paper Abstract

SiO2 and HfO2 thin films have been deposited on polished fused silica substrates by the ion assisted electron beam evaporation technique in different deposition conditions. The role of the assisting ion beam parameters either on the otpical and structural film properties and the film damage threshold at 308 nm has been investigated. Laser damage thresholds have been determined by the photoacoustic mirage technique.

Paper Details

Date Published: 7 September 1999
PDF: 10 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360097
Show Author Affiliations
M. Di Giulio, INFM/Univ. di Lecce (Italy)
Marco Alvisi, INFM/Univ. di Lecce (Italy)
Maria Rita Perrone, INFM/Univ. di Lecce (Italy)
Maria Lucia Protopapa, INFM/Univ. di Lecce (Italy)
Antonio Valentini, INFM/Univ. di Bari (Italy)
Lorenzo Vasanelli, INFM/Univ. di Lecce (Italy)


Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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