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Proceedings Paper

Mechanical stress in fluoride coatings
Author(s): Jens Ullmann; Hans-Georg Keck; Roland Thielsch; Hein Uhlig; Norbert Kaiser
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Paper Abstract

The mechanical behavior of fluoride single layers and thick model layer systems were carried out ex-situ after deposition at laboratory conditions. The samples on substrates with different thermal expansion coefficients have been prepared by a low loss evaporation process. Investigation were performed for single layers deposited at different film thickness, substrate temperature and storage time. All investigated fluorides posses tensile stress of various amounts. The thermal stress component seems to be the major contribution to the total stress MgF2 films of about 100 nm thickness deposited onto silicon substrate. The stress and force per unit width of model multilayer systems formed from different fluorides were examined and correlated to the ability of crack formation on thick rigid fused silica substrates. Optimization of the stress values, the bending force and the crack formation was performed by adjusting the deposition temperature and by introducing a third stress reducing material in the stack. An example of a stress optimized high reflector will be shown.

Paper Details

Date Published: 7 September 1999
PDF: 12 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360074
Show Author Affiliations
Jens Ullmann, Carl Zeiss (Germany)
Hans-Georg Keck, Carl Zeiss (Germany)
Roland Thielsch, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)
Hein Uhlig, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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