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Proceedings Paper

Silicon nitride membranes for filtration and separation
Author(s): Paul Galambos; Kevin Zavadil; Randy J. Shul; Christi Lober Willison; Samuel L. Miller
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Paper Abstract

Semi-Permeable silicon nitride membranes have been developed using a Bosch etch process followed by a reactive ion etch process. These membranes were observed to allow air but not water to pass through them into surface micromachined, silicon nitride microfluidic channels. Membranes with this property have potential use in microfluidic systems as gas bubble traps and vents, filters to remove particles and gas partitioning membranes. Membrane permeation was measured as 1.6 X 10-8 mol/m2Pa s of helium for inline membranes at the entrance and exit of the silicon nitride microfluidic channels.

Paper Details

Date Published: 19 August 1999
PDF: 11 pages
Proc. SPIE 3877, Microfluidic Devices and Systems II, (19 August 1999); doi: 10.1117/12.359346
Show Author Affiliations
Paul Galambos, Sandia National Labs. (United States)
Kevin Zavadil, Sandia National Labs. (United States)
Randy J. Shul, Sandia National Labs. (United States)
Christi Lober Willison, Sandia National Labs. (United States)
Samuel L. Miller, Sandia National Labs. (United States)


Published in SPIE Proceedings Vol. 3877:
Microfluidic Devices and Systems II
Chong Hyuk Ahn; A. Bruno Frazier, Editor(s)

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