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Proceedings Paper

Imaging interferometric lithography: extending optics to fundamental limits and beyond
Author(s): Steven R. J. Brueck
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Paper Abstract

Optical lithography has been the mainstay VLSI/ULSI manufacturing technique throughout the entire history of the integrated circuit. The "end" of optical lithography has been oft predicted, and just as often proven premature. Even today, despite all the recent investigation of next-generation lithographies (NGL), it now appears certain that optics will be used for 100-nm critical dimensions (CD) and likely, that optical tools will extend at least to initial stages of the 70-nm CD roadmap node as well, cxtending optical lithography to deep sub-wavelength CDs.

Paper Details

Date Published: 19 July 1999
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354787
Show Author Affiliations
Steven R. J. Brueck, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)

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