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Proceedings Paper

DOF improvement by complex pupil filtering for DUV lithography
Author(s): Piotr Jedrasik
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Paper Abstract

We propose a method for the design of a complex optical element for use in lithographic system. It is based on optimization of the intensity point spread function of the lithographic projector. Increase in the depth of focus up to +/- 3micrometers in comparison with unaltered pupil demonstrated. This is achieved without introducing significant undesirable proximity effects, and in such a way, control over the sidelobe level is achieved. The solution is universal, without any reference to the projection of the particular mask layout. The analytical representation of the filter allows for explicit optimization process. Practical realization of the filter based on statistical approach is presented. Limitations of the proposed approach are discussed.

Paper Details

Date Published: 26 July 1999
PDF: 12 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354398
Show Author Affiliations
Piotr Jedrasik, Chalmers Univ. of Technology (Sweden)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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