Share Email Print
cover

Proceedings Paper

Off-axis illumination for improving depth of focus for isolated features
Author(s): James G. Tsacoyeanes
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Off-axis illumination is an optical enhancement method that has been widely used and discussed. The basic idea has been that for dense features, two diffracted orders 0th and 1st, symmetrically located about the optical axis of the projection optics, interfere so that the phase difference between them is minimized producing enhanced depth of focus (DOF). As discrete orders to not exist for isolated features, little if any improvement is seen in DOF. However it will be shown that for isolated features that are print biased, off-axis illumination can provide significant improvement in DOF over conventional illumination techniques and consequently improved CD control. The results from both aerial image and resist simulations will be compared for a 157 nm, .7 NA system. It will be shown that the nonlinear properties of the resist, reduces the DOF.

Paper Details

Date Published: 26 July 1999
PDF: 12 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354392
Show Author Affiliations
James G. Tsacoyeanes, SVG Lithography, Inc. (United States)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

© SPIE. Terms of Use
Back to Top