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Proceedings Paper

Experimental comparison of off-axis illumination and imaging interferometric lithography
Author(s): Xiaolan Chen; Steven R. J. Brueck
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Paper Abstract

Imaging interferometric lithography (IIL) is a newly developed technology extending the resolution of optical lithography (OL) to the linear-systems limits of optics. IIL is an extension of off-axis illumination (OAI) for offset angles larger than the numerical aperture (NA) of the optical system. In this work, the connection of IIL with quadruple OAI is demonstrated by reduction the offset angle to within the optical system NA. This gives rise to an effective optical transfer function that decreases at higher spatial frequencies since multiple counting of the lower frequency space components emphasizes the low-frequency response. Pupil plane filters are introduced to eliminate this multiple coverage and improve the pattern fidelity. Simulation results are in excellent agreement with the experiments, reproducing even the fine pattern details. Tiling of spatial frequency space with different pupil plane filters for both OAI and IIL approaches has also been investigated. Pattern fidelity is significantly affected by the tiling scheme with the IL approach yielding the most robust overall image performance.

Paper Details

Date Published: 26 July 1999
PDF: 9 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354390
Show Author Affiliations
Xiaolan Chen, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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