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Proceedings Paper

Automatic parallel optical proximity correction system for application with hierarchical data structure
Author(s): Eiji Tsujimoto; Takahiro Watanabe; Kyoji Nakajo
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Paper Abstract

To enable very fast OPC, we have developed an automatic parallel-processing optical proximity correction system named Acropolis using a rule-based approach for very large scale layout data. Acropolis can easily handle giga-byte order layout data using parallel processing while preserving data hierarchy as much as possible. This system is also linked to a layout editor through an added-on menu, so that the designer can perform layout considering both original and OPC'ed mask data. In this paper, we describe the evaluation results of Acropolis.

Paper Details

Date Published: 26 July 1999
PDF: 11 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354382
Show Author Affiliations
Eiji Tsujimoto, Hitachi, Ltd. (Japan)
Takahiro Watanabe, Hitachi, Ltd. (Japan)
Kyoji Nakajo, Hitachi ULSI Systems Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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