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Proceedings Paper

Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
Author(s): Sachiko Kobayashi; Taiga Uno; Kazuko Yamamoto; Satoshi Tanaka; Toshiya Kotani; Soichi Inoue; Hitoshi Higurashi; Susumu Watanabe; Mitsuhiro Yano; Sinichiro Ohki; Kiyoshi Tsunakawa
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Paper Abstract

We propose a high-performance hierarchical mask data processing system which incorporates a refined 1D optical proximity correction (OPC) method. Using an engineering workstation, the system incorporating the refined 1D OPC, corrected the metal layer in a miniature model of a 1-Gbit DRAM within a practical time. Well-designed hierarchical management in the mask data conversion system reduced the correction time to about 1/12 of that in flat processing. Data volume expansion was suppressed within four percent compared to the mask data volume without OPC. Using both exposure experiment and lithography simulation, the correction accuracy was examined when the system was applied to test patterns of metal layer. In the case of 0.16 micrometers design rule, the range of linewidth error with refined 1D OPC was reduced to 62 nm compared to 99 nm with the conventional 1D OPC method. The proposed method is expected to achieve precise correction compared to conventional 1D OPC method. These rules suggest that the proposed OPC system is useful for correction of 1-Gbit DRAM and beyond.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354374
Show Author Affiliations
Sachiko Kobayashi, Toshiba Corp. (Japan)
Taiga Uno, Toshiba Corp. (Japan)
Kazuko Yamamoto, Toshiba Corp. (Japan)
Satoshi Tanaka, Toshiba Corp. (Japan)
Toshiya Kotani, Toshiba Corp. (Japan)
Soichi Inoue, Toshiba Corp. (Japan)
Hitoshi Higurashi, Toshiba Corp. (Japan)
Susumu Watanabe, Toshiba Corp. (Japan)
Mitsuhiro Yano, Toshiba Corp. (Japan)
Sinichiro Ohki, Toshiba Corp. (Japan)
Kiyoshi Tsunakawa, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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