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Proceedings Paper

Pattern asymmetries in phase-edge imaging
Author(s): Michael Fritze; Susan G. Cann; Peter W. Wyatt
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Paper Abstract

Strong phase-shift methods such as alternating aperture and chromeless edge are resolution-enhancement techniques that promise to extend optical lithography to the 100-nm regime and possibly below.

Paper Details

Date Published: 26 July 1999
PDF: 15 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354369
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
Peter W. Wyatt, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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