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Proceedings Paper

Integration of alternating phase-shift mask technology into optical proximity correction
Author(s): Joerg Thiele; Christoph M. Friedrich; Christoph Dolainsky; Paul Karakatsanis; Wilhelm Maurer
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Paper Abstract

The paper describes the extension of optical proximity correction (OPC), which is well established for conventional chromium-on-glass mask printing, to alternating phase shift masks (altPSM). Aerial image simulation of various situations of light-field and dark-field altPSM shows that the size of the phase shifter has a great impact on the printed critical dimension (CD). Especially layouts containing non-symmetric phase shifters or shifter sizes comparable to the nominal CD do not print on target. The application of optical proximity correction to the chromium structures between the phase shifters is capable to compensate for such effects. We demonstrate the added value of OPC using a simulation-based software tool for altPSM.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354367
Show Author Affiliations
Joerg Thiele, Siemens AG (Germany)
Christoph M. Friedrich, Siemens AG (Germany)
Christoph Dolainsky, aiss GmbH (Germany)
Paul Karakatsanis, aiss GmbH (Germany)
Wilhelm Maurer, Siemens AG (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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